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US 2013/0153533 A1Published application
Method for tuning wavelength of optical device using refractive index quasi-phase change and etching
AssigneeElectronics and Telecommunications Research Institute
InventorsSahnggi PARK, Gyungock KIM
Life of this patent
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Abstract
Methods for tuning a wavelength of an optical device are provided. According to the method, a core pattern may be formed on a substrate, a dielectric layer may be formed to cover the core pattern, and the dielectric layer may be thermally treated to increase a refractive index of the dielectric layer. The dielectric layer may include a silicon oxynitride layer.
Claims16
A method for tuning a wavelength of an optical device, comprising:
- forming an optical device including a core pattern on a substrate and a dielectric layer covering the core pattern;
- and
- thermally treating the optical device to increase a refractive index of the dielectric layer,
- wherein the dielectric layer includes a silicon oxynitride (SiON) layer.
1 more element
A method for tuning a wavelength of an optical device, comprising:
- forming an optical device including a core pattern on a substrate, a dielectric layer covering the core pattern, and a cladding layer covering the dielectric layer;
- and
- etching the cladding layer to reduce a refractive index of the cladding layer.
Dependencies are inferred from the claim text.