Sensing device and fabricating method thereof

A fabricating method of a sensing device, comprising:

• forming a sensing element on a first substrate;
• forming an exhaust vent on a second substrate, wherein the exhaust vent penetrates through a first surface and a second surface of the second substrate;
• forming a gas sealing filter on the second substrate, wherein the gas sealing filter comprises at least one pass having a section in the shape of an irregular curve, the pass penetrates through the gas sealing filter, and a width of the pass is in a range of several nanometers to several hundred nanometers;
• bonding the second substrate on the first substrate, wherein the first substrate and/or the second substrate comprises a recessed portion, and a chamber is formed between the second substrate and the first substrate;
• and
• forming a gas sealing layer on the second substrate to seal the chamber, wherein the gas sealing layer at least covers the exhaust vent, a part of the gas sealing filter and a part of the pass.