Method for producing spectroscopic sensor
AssigneeHamamatsu Photonics K.K.
InventorsKatsumi Shibayama, Masaomi Takasaka
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AssigneeHamamatsu Photonics K.K.
InventorsKatsumi Shibayama, Masaomi Takasaka
Estimating the term…
A method of manufacturing a spectroscopic sensor 1 comprises a first step of forming a cavity layer 21 by nanoimprinting on a handle substrate; a second step of forming a first mirror layer 22 on the cavity layer 21 after the first step; a third step of joining a light-transmitting substrate 3 onto the first mirror layer 22 after the second step; a fourth step of removing the handle substrate from the cavity layer 21 after the third step; a fifth step of forming a second mirror layer 23 on the cavity layer 21 without the handle substrate after the fourth step; and a sixth step of joining the light detection substrate 4 onto the second mirror layer 23 after the fifth step.
A method of manufacturing a spectroscopic sensor comprising an interference filter unit, having a cavity layer and first and second mirror layers opposing each other through the cavity layer, for selectively transmitting therethrough light in a predetermined wavelength range according to an incident position thereof;
Dependencies are inferred from the claim text.