Joint system, substrate processing system, and joint method
AssigneeTokyo Electron Limited
InventorsOsamu Hirakawa, Naoto Yoshitaka, Masataka Matsunaga, Norihiko Okamoto
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AssigneeTokyo Electron Limited
InventorsOsamu Hirakawa, Naoto Yoshitaka, Masataka Matsunaga, Norihiko Okamoto
Estimating the term…
The present disclosure includes: a joint processing station including a coating unit applying an adhesive to a processing target substrate or a supporting substrate, a first heat processing unit heating the substrates coated with the adhesive, a second heat processing unit heating the substrates to a higher temperature, a reversing unit reversing front and rear surfaces of the substrate, a joint unit joining the processing target substrate and the supporting substrate together by pressing them, and a transfer region for transferring the substrates to the units; and a transfer-in/out station transferring the substrates into/from the joint processing station.
1-20. (canceled)
A joint system joining a processing target substrate and a supporting substrate together, comprising:
A substrate processing system comprising a joint system joining a processing target substrate and a supporting substrate together,
A joint method of joining a processing target substrate and a supporting substrate together using a joint system,
Dependencies are inferred from the claim text.