Process chamber pressure control system and method
AssigneeSPTS Technologies Limited
InventorDaniel J Vestyck
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Abstract
A method of and apparatus for controlling pressure in a process chamber having a continuous gas inlet flow and a continuous gas outlet flow comprising providing a pulsed valve at a gas outlet, a pressure gauge, and a programmable controller and varying the pulse rate of the pulsed valve, wherein either the open time or closed time, or both open and closed times, is lengthened or shortened, depending on whether the gauge pressure is above or below the programmed setpoint.
Claims15
A process chamber apparatus having an inlet for continuous gas inlet flow and an outlet for continuous gas outlet flow, a means for controlling process chamber pressure comprising a pressure gauge, a programmable logic controller, and a pulsed valve at, or in fluid communication with, the outlet, the pulsed valve having a controllable pulse rate, the controller programmed to process pressure data from the pressure gauge and to control the pulse rate of the pulsed valve to control the process chamber pressure.
A method of controlling pressure in a process chamber having a continuous gas inlet flow and a continuous gas outlet flow comprising providing a pulsed valve at a gas outlet, a pressure gauge, and a programmable controller and varying the pulse rate of the pulsed valve.
Dependencies are inferred from the claim text.