Flow rate control using mass flow rate control device
AssigneeHitachi Metals, Ltd.
InventorsTakao GOTO, Makoto TANAKA
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AssigneeHitachi Metals, Ltd.
InventorsTakao GOTO, Makoto TANAKA
Estimating the term…
A process and device enabling accurate mass flow control is described. A mass flow controller can be re-specified corresponding to multiple types of actual process gases and multiple flow rate ranges, even after the mass flow controller has been shipped. Calibration gas data is derived using actual flow rate versus a flow rate setting signal to generate calibration gas data. Actual gas data is derived by measuring actual flow rate versus a flow rate setting signal for each actual gas and saving. Subsequently, prior to operating the mass flow rate control device, the characteristic data for an actual and the calibration gas characteristic data is recalled. The calibration gas characteristic data is then converted to controlled flow rate correction data based on the actual gas characteristic data that is saved to the control unit and the actual gas flow rate is corrected based on this controlled flow rate correction data.
A method for controlling flow rate of a gas flowing on a flow path, comprising the steps of:
A flow rate control device for controlling flow of a gas flowing through a flow path, comprising:
A computer program product for controlling flow rate of a gas flowing on a flow path, wherein the computer program product includes:
Dependencies are inferred from the claim text.