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AssigneeApplied Materials, Inc.
InventorsKARTIK SANTHANAM, MATTHEW D. SCOTNEY-CASTLE, MANOJ VELLAIKAL, PETER I. PORSHNEV
Estimating the term…
Methods for processing a substrate are provided herein. In some embodiments, a method of processing a substrate may include implanting a dopant species into the one or more regions of the substrate using a first dopant precursor comprising a hydride of the dopant species; and implanting the dopant species into the one or more regions of the substrate using a second dopant precursor comprising fluorine and the dopant species. In some embodiments, the first and second dopant precursors may be provided simultaneously. In some embodiments, the first dopant precursor may be provided for a first time period, followed by providing the first dopant precursor and the second dopant precursor for a second period of time. In some embodiments, the flow of the first dopant precursor and the flow of the second dopant precursor may be alternated until a desired implant level is reached.
A method of processing a substrate having one or more regions to be doped, comprising:
A method of processing a substrate having one or more regions to be doped, comprising:
A computer readable medium having instructions stored thereon that, when executed cause a substrate processing system to perform a method, the method comprising:
Dependencies are inferred from the claim text.