Linear atomic layer deposition apparatus
AssigneeSynos Technology, Inc.
InventorSang In LEE
Life of this patent
Estimating the term…
Abstract
Embodiments relate to a linear deposition apparatus with mechanism for securing a shadow mask and a substrate onto a susceptor. The linear deposition apparatus includes a set of members attached to latches that are raised to unlock the shadow mask and the substrate from the susceptor. The latches are lowered to secure the shadow mask and the substrate to the susceptor. Another set of members are provided in the linear deposition apparatus to move and align the shadow mask with the substrate. The linear deposition apparatus also includes a main body and two wings provided at both sides of the main body to receive the substrate as the substrate moves linearly to expose the substrate to materials or radicals injected by reactors.
Claims20
An apparatus comprising:
- a plurality of reactors configured to inject source precursor and reactant precursor for performing the atomic layer deposition on a substrate;
- a susceptor mounted with the substrate and moving relative to the plurality of reactors between a first end position and a second end position in a direction that is substantially perpendicular to a direction in which the source precursor and the reactant precursor are injected onto the substrate by the plurality of reactors, wherein a length of the susceptor is longer than the substrate by at least twice the width of the plurality of the reactors to place at least a portion of the susceptor in paths of the injected source precursor and the injected reactant precursor at the first end position and the second end position;
- and
- at least one component configured to move the susceptor between the first position and the second position.
An apparatus comprising:
- a first reactor configured to inject source precursor;
- a second reactor configured to inject reactant precursor;
- a susceptor mounted with the substrate and moving relative to the first and second reactors between a first end position and a second end position in a direction that is substantially perpendicular to a direction in which the source precursor and the reactant precursor are injected onto the substrate by the first and second reactors;
- a valve assembly connected to the first and second reactors to provide the source precursor to the first reactor while the substrate passes across the first reactor but provide purge gas to the first reactor before or after the substrate passes across the first reactor, the valve assembly connected to the second reactor to provide the reactant precursor to the second reactor while the substrate passes across second reactor but provide purge gas to the second reactor before or after the substrate passes across the second reactor;
- and
- at least one component configured to move the susceptor between the first position and the second position.
Dependencies are inferred from the claim text.