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AssigneeASML Netherlands B.V.
InventorsRaymond Wilhelmus Louis LAFARRE, Sjoerd Nicolaas Lambertus Donders, Antonius Franciscus Johannes De Groot, Hubert Marie Segers, Johannes Petrus Martinus Bernardus Vermeulen, Raimond Visser, Johannes Charles Adrianus Van Den Berg, Jan Steven Christiaan Westerlaken, Yang-Shan Huang, Christiaan Louis Valentin
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A lithographic apparatus comprises a substrate table constructed to hold a substrate and a gripper arranged to position the substrate on the substrate table. The gripper includes an electrostatic clamp arranged to clamp the substrate at a top side thereof. The electrostatic clamp is arranged to clamp at least part of a circumferential outer zone of a top surface of the substrate. The invention provides a substrate handling method including positioning the substrate by means of a gripper on a substrate table of a lithographic apparatus. The substrate is clamped at a top side thereof by using an electrostatic clamp of the gripper.
A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate, the lithographic apparatus comprising:
A substrate handling method comprising positioning the substrate by means of a gripper on a substrate table of a lithographic apparatus, the method comprising clamping the substrate at a top side thereof by means of an electrostatic clamp of the gripper, wherein a stiffness of the clamp is lower than an average stiffness of the to be gripped substrate.
A substrate handler for handling a substrate, the substrate handler comprising a gripper for gripping the substrate and positioning the substrate on a substrate table, wherein the gripper comprises an electrostatic clamp arranged to clamp the substrate at a top side thereof, wherein a stiffness of the clamp is lower than an average stiffness of the to be gripped substrate.
Dependencies are inferred from the claim text.