Exposure apparatus and device manufacturing method

An exposure apparatus including an optical system having an illumination optical system configured to illuminate an original formed with a pattern with light from a light source and a projection optical system configured to project an image of the pattern on a substrate that includes an arc-shaped portion on an outer edge, the exposure apparatus comprising:

• a light shielding plate arranged on or near to a conjugate plane with a object plane of the projection optical system on an optical path in the optical system, and including an arc-shaped portion for defining at least a part of an outer edge of a region on which the pattern image is projected on the substrate in an arc shape;
• a rotational drive unit configured to rotatably drive the light shielding plate around an axis of rotation along an optical path in the optical system;
• a shift drive unit configured to shift-drive the light shielding plate in a direction intersecting the axis of rotation;
• an acquisition unit configured to acquire information relating to a relative position between a reference axis serving as a reference when the pattern image is projected on the substrate by the optical system and the axis of rotation;
• and
• a control unit configured to control the rotational drive unit and the shift-drive unit so that, when projecting the pattern image on a circumferential portion near an outer edge of the substrate, the light shielding plate is positioned at a predetermined position based on the information relating to the relative position.