Beam Monitoring Device, Method, And System

A method comprising:

• providing a first and a second beam monitoring device, the first beam monitoring device including a first 1D profiler and a first 2D profiler and the second beam monitoring device including a second 1D profiler and a second 2D profiler, wherein the first 1D profiler includes a first 1D Faraday and the first 2D profiler includes a first 2D Faraday, and wherein the second 1D profiler includes a second 1D Faraday and the second 2D profiler includes a second 2D Faraday;
• scanning a beam having a first dimension and a second dimension, wherein scanning the beam includes scanning the beam along the first dimension with the first 1D Faraday and the second 1D Faraday and scanning the beam along the second dimension with the first 2D Faraday and the second 2D Faraday;
• and
• scanning an angle of the beam with the first 2D Faraday and the second 2D Faraday.

A system comprising:

• a first beam monitoring device and a second beam monitoring device, wherein the first beam monitoring device includes a first 1D profiler including a first 1D Faraday and a first 2D profiler including a first 2D Faraday, wherein the second beam monitoring device includes a second 1D profiler including a second 1D Faraday and a second 2D profiler including a second 2D Faraday;
• a first control arm component coupled to the first beam monitoring device;
• and
• a second control arm component coupled to the second beam monitoring device,
• wherein the first control arm component is configured to:
• move the first beam monitoring device along the length of a beam such that the first 1D profiler traverses a first cross section of the beam, wherein traversing of the first cross section causes the beam to pass through an opening of the first 1D Faraday thereby inducing a current in the first 1D Faraday;
• move the first beam monitoring device along the width of the beam such that the first 2D profiler traverses the first cross section of the beam, wherein the traversing of the first cross section causes the beam to pass through an opening of the first 2D Faraday thereby inducing a current in the first 2D Faraday;
• and
• rotate the first beam monitoring device about a first axis such that the first 2D profiler traverses an angle of the beam across the first cross section of the beam;
• wherein the second control arm component is configured to:
• move the second beam monitoring device along the length of the beam such that the second 1D profiler traverses a second cross section of the beam, wherein traversing of the second cross section causes the beam to pass through an opening of the second 1D Faraday thereby inducing a current in the second 1D Faraday;
• move the second beam monitoring device along the width of the beam such that the second 2D profiler traverses the second cross section of the beam, wherein the traversing of the second cross section causes the beam to pass through an opening of the second 2D Faraday thereby inducing a current in the second 2D Faraday;
• and
• rotate the second beam monitoring device about a second axis such that the second 2D profiler monitors an angle of the beam across the second cross section of the beam.