Cleaning apparatus and cleaning method for components of metal organic chemical vapor deposition device

Abstract

A cleaning apparatus a metal organic chemical vapor deposition (MOCVD) device incorporating a susceptor rotatably holding the plurality of substrate holders through a rotating mechanism of a bearing; and a cleaning method for efficiently removing deposits from components of the device. The cleaning apparatus includes storage for the susceptor and the plurality of substrate holders; a means for rotating the susceptor and/or a means for rotating the plurality of substrate holders; a heater; a cleaning gas-introducing port; and a cleaning gas-discharging port. The susceptor holding the plurality of substrate holders is stored in the cleaning apparatus after the device is used for vapor phase epitaxy, and cleaning gas is introduced to the susceptor while the susceptor and/or each of the substrate holders is rotated, so as to remove deposits deposited during vapor phase epitaxy.

Dependencies are inferred from the claim text.