Substrate processing apparatus and substrate processing method
AssigneeSCREEN Holdings Co., Ltd.
InventorsHiroaki KITAGAWA, Katsuhiko MIYA
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Abstract
A substrate processing apparatus comprising: a substrate holder which holds a substrate having a pattern formed in a surface of the substrate in a predetermined positional relationship with a reference indicator of the substrate; and a cleaner which abuts an adhesive member on the surface of the substrate which is held by the substrate holder and peels off the adhesive member along the surface of the substrate in a peeling direction which is not at right angle to a direction of the pattern, thereby cleaning the surface of the substrate.
Claims9
A substrate processing apparatus comprising:
- a substrate holder which holds a substrate having a pattern formed in a surface of the substrate in a predetermined positional relationship with a reference indicator of the substrate;
- and
- a cleaner which abuts an adhesive member on the surface of the substrate which is held by the substrate holder and peels off the adhesive member along the surface of the substrate in a peeling direction which is not at right angle to a direction of the pattern, thereby cleaning the surface of the substrate.
A substrate processing method comprising the steps of:
- holding a substrate which has a pattern formed in a surface of the substrate in a predetermined positional relationship with a reference indicator of the substrate by a substrate holder;
- abutting an adhesive member on the surface of the substrate held by the substrate holder;
- and
- peeling the adhesive member along the surface of the substrate in a peeling direction which is not at right angle to a direction of the pattern, thereby cleaning the surface of the substrate.
Dependencies are inferred from the claim text.