Heating systems for thin film formation
AssigneePinecone Material Inc.
InventorHeng Liu
Life of this patent
Estimating the term…
Abstract
A material deposition system is provided for forming one or more layers of one or more materials on one or more substrates. The system includes a susceptor component. A plurality of substrate holders are supported on or over the susceptor component. Either the susceptor component is configured to rotate around a susceptor axis, or each substrate holder is configured to rotate about a respective holder axis, or both. Heating devices heat each substrate to a substantially constant temperature relative to a radial distance of the substrate from a central point of the susceptor component substantially only through heat convection or radiation, with comparatively little, if any, heat conduction through the susceptor component and the one or more substrate holders.
Claims20
A material deposition fabrication system comprising:
- a susceptor component configured to rotate around a susceptor axis;
- one or more substrate holders being positioned on or over the susceptor component eccentrically with respect to the susceptor axis, each holder configured to hold one or more substrates, wherein the substrate holders are also configured to rotate around the susceptor axis;
- and
- one or more heating devices configured, through rotation of the susceptor component about its susceptor axis, to heat each substrate to a substantially constant temperature relative to a radial distance of the substrate from the susceptor axis;
- wherein the one or more heating devices are configured to heat the one or more substrates substantially only through heat convection or radiation, with comparatively little, if any, heat conduction through the susceptor component and the one or more substrate holders.
A material deposition fabrication system comprising:
- a susceptor component;
- a plurality of substrate holders positioned on or over the susceptor component, each substrate holder configured to rotate about a respective holder axis, and each substrate holder configured to hold one or more substrates;
- one or more heating devices configured, through rotation of each substrate holder about its corresponding holder axis, to heat each substrate to a substantially constant temperature relative to a radial distance of the substrate from a central point of the susceptor component;
- wherein the one or more heating devices are configured to heat the one or more substrates substantially only through heat convection or radiation, with comparatively little, if any, heat conduction through the susceptor component and the substrate holders.
A material deposition fabrication system comprising:
- a susceptor component configured to rotate around a susceptor axis;
- a plurality of substrate holders positioned on or over the susceptor component, each substrate holder configured to rotate about a respective holder axis, and each substrate holder configured to hold one or more substrates;
- one or more heating devices configured to heat each substrate to a substantially constant temperature relative to a radial distance of the substrate from a central point of the susceptor component;
- wherein the one or more heating devices are configured to heat the one or more substrates substantially only through heat convection or radiation, with comparatively little, if any, heat conduction through the susceptor component and the one or more substrate holders.
Dependencies are inferred from the claim text.