Oxynitride phosphor and method of manufacturing the same
AssigneeFormosa Epitaxy Incorporation
InventorsCHENG-I CHU, RU-SHI LIU, YU-CHIH LIN, CHEN-HONG LEE, WEI-KANG CHENG, YI-SHENG TING, SHYI-MING PAN
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AssigneeFormosa Epitaxy Incorporation
InventorsCHENG-I CHU, RU-SHI LIU, YU-CHIH LIN, CHEN-HONG LEE, WEI-KANG CHENG, YI-SHENG TING, SHYI-MING PAN
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An oxynitride phosphor and a method of manufacturing the same are revealed. The formula of the oxynitride phosphor is Ba3-xSi6O12N2: Yx (0≦x≦1). Y is praseodymium (Pr) or terbium (Tb) used as a luminescent center. The oxynitride phosphor is synthesized by solid-state reaction. The oxynitride phosphor is excited by vacuum ultraviolet light with a wavelength range of 130 nm to 300 nm or ultraviolet to visible light with a wavelength range of 300 nm to 550 nm to emit light with a wavelength range of 400 nm to 700 nm. Moreover, the full-width at half-maximum of the emission spectrum is smaller than 30 nm. Thus the oxynitride phosphor is suitable for applications of backlights, plasma display panels and ultraviolet excitation. The oxynitride phosphor has higher application value.
An oxynitride phosphor having a formula Ba2.89Si6O12N2:
Dependencies are inferred from the claim text.