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US 2012/0270150 A1Published application
Substrate distortion measurement
AssigneeASML Netherlands B.V.
InventorErik Marie Jose SMEETS
Life of this patent
Estimating the term…
Abstract
A substrate distortion measurement apparatus comprising one or more optical detectors arranged to measure the locations of pits or holes provided in a substrate, a memory arranged to store previously determined locations of the pits or holes in the substrate, and a comparator arranged to compare the measured locations of the pits or holes with the previously determined locations of the pits or holes, to determine distortion of the substrate.
Claims19
-13. (canceled)
A substrate comprising
- a photosensitive layer;
- and
- a mark layer having at least 1000 marks.
-30. (canceled)
Dependencies are inferred from the claim text.