Novel high speed high density nand-based 2t-nor flash memory design
AssigneeAplus Flash Technology, Inc.
InventorsPeter Wung Lee, Fu-Chang Hsu
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AssigneeAplus Flash Technology, Inc.
InventorsPeter Wung Lee, Fu-Chang Hsu
Estimating the term…
A two transistor NOR flash memory cell has symmetrical source and drain structure manufactured by a NAND-based manufacturing process. The flash cell comprises a storage transistor made of a double-poly NMOS floating gate transistor and an access transistor made of a double-poly NMOS floating gate transistor, a poly1 NMOS transistor with poly1 and poly2 being shorted or a single-poly poly1 or poly2 NMOS transistor. The flash cell is programmed and erased by using a Fowler-Nordheim channel tunneling scheme. A NAND-based flash memory device includes an array of the flash cells arranged with parallel bit lines and source lines that are perpendicular to word lines. Write-row-decoder and read-row-decoder are designed for the flash memory device to provide appropriate voltages for the flash memory array in pre-program with verify, erase with verify, program and read operations in the unit of page, block, sector or chip.
A NAND-based 2T-NOR flash memory array comprising:
Dependencies are inferred from the claim text.