US 2012/0268742 A1 · APPARATUS AND METHOD FOR INSPECTING PATTERN DEFECT

Abstract

Provided is a pattern defect inspecting apparatus wherein inspection performance is stabilized. The defect inspecting apparatus, which has a plurality of configuration units and inspects defects on the surface of a sample, is provided with a means for monitoring time-dependent changes and failures of some of or all of the configuration units, and a means for notifying the user of the results of the monitoring. Furthermore, a unit which can perform correction is provided with a correcting means, and also a means for replacing a failure component with a spare component which has been prepared in the device.

Claims34

Dependent claims

A defect inspecting apparatus which includes a plurality of configuration units and inspects a defect on a surface of a sample, the defect inspection apparatus comprising:

a monitoring unit for monitoring a time dependent change of a part of or all of the configuration units, and
a notification unit for notifying a result of the monitoring.

Dependencies are inferred from the claim text.

Facts

Application

13/386,243Filed 21 Jun 2010

Priority

JP 2009-17171923 Jul 2009

Published

25 Oct 2012

Term ends

Not estimatedThe source records don’t support an estimate.

Classification7 codes

G01N 21/956
Characterised by the material or shape of the object to be examined: inspecting patterns on the surface of objects
G01N 21/9501
Characterised by the material or shape of the object to be examined: semiconductor wafers
G01R 31/2656
Contactless testing: using non-ionising electromagnetic radiation, e.g. optical radiation
H10P 72/53
For positioning, orientation or alignment: using optical controlling means

Apparatus and method for inspecting pattern defect

Life of this patent

Apparatus and method for inspecting pattern defect

Life of this patent

Abstract

Claims34