Method of manufacturing substrate for photovoltaic cell
AssigneeSamsung Corning Precision Materials Co., Ltd.
InventorsYoungZo Yoo, SeoHyun Kim, Gun Sang Yoon
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Abstract
A method of manufacturing a substrate for a photovoltaic cell, in which the high optical characteristic in a long-wavelength range available for the photovoltaic cell can be maintained, and at the same time, the amount of hazing can be increased. The method includes the step of forming a zinc oxide (ZnO) thin film layer doped with a dopant on a transparent substrate, and the step of controlling the surface structure of the zinc oxide thin film layer by etching the zinc oxide thin film layer using hydrogen plasma.
Claims13
A method of manufacturing a substrate for a photovoltaic cell, comprising:
- forming a zinc oxide thin film layer doped with a dopant on a transparent substrate;
- and
- controlling a surface structure of the zinc oxide thin film layer by etching the zinc oxide thin film layer using hydrogen plasma.
A substrate for a photovoltaic cell, comprising a transparent substrate and a zinc oxide thin film layer formed on the transparent substrate, the zinc oxide thin film layer being doped with a dopant,
- wherein a (11-20) plane of the zinc oxide thin film layer is selectively etched by hydrogen plasma, and the zinc oxide thin film layer is doped with hydrogen by the hydrogen plasma, such that a hydrogen passivation film is formed thereon.
Dependencies are inferred from the claim text.