Retargeting for Electrical Yield Enhancement
AssigneeInternational Business Machines Corporation
InventorKanak B. Agarwal
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AssigneeInternational Business Machines Corporation
InventorKanak B. Agarwal
Estimating the term…
A mechanism is provided for electrical yield enhancement retargeting of photolithographic layouts. Optical proximity correction is performed on a set of target patterns in order to produce a set of optical proximity correction mask shapes. A set of lithographic contours is generated for each of the set of optical proximity correction mask shapes. A determination is made of electrical yield sensitivities for at least one shape in a set of shapes in the set of target patterns. A determination is also made as to an amount and a direction of retargeting for each of the at least one shape in the set of shapes based on the electrical yield sensitivity of the shape. A new set of target patterns with retargeted edges is generated for each shape in the at least one shape based on the amount and the direction of retargeting.
A method, in a data processing system, for electrical yield enhancement retargeting of photolithographic layouts, the method comprising:
A computer program product comprising a computer readable storage medium having a computer readable program stored therein, wherein the computer readable program, when executed on a computing device, causes the computing device to:
An apparatus, comprising:
Dependencies are inferred from the claim text.