Method and Device for Controlling the Manufacture of Semiconductor by Measuring Contamination

A device for handling substrates within a semiconductor manufacturing plant (1) having substrate processing equipments, substrate storage means, substrate transport means, and a manufacturing execution system (MES) functionally related with the substrate processing equipments, with the substrate storage means and with the substrate transport means, comprising:

• at least one substrate storage and transport box that is transported by the transport means and stored in the storage means,
• at least one gas analysis device of the gases forming the internal atmosphere of the substrate storage and transport box, which produces analysis signals representative of the quantity of the critical gas that is able to generate molecular contamination, which is present in the storage and transport box,
• an execution device which pilots the transport means and the storage means, with the execution device comprising instructions for detecting a molecular decontamination need as a function of analysis signals emitted by the gas analysis device.

A method for handling substrates within a semiconductor manufacturing plant, the method comprising:

• distributing the substrates into batches each contained within a storage and transport box,
• analyzing the gases in the internal atmosphere of a storage and transport box,
• selectively directing the storage and transport box to a storage means or to a decontamination station as a function of the result of the gas analysis.