Substrate processing apparatus, program for controlling the same, and method for fabricating semiconductor device

A substrate processing apparatus, comprising:

• a mounting stand on which a substrate accommodation container accommodating a plurality of substrates therein is held;
• a cover opening and closing unit configured to open and close a cover of the substrate accommodation container mounted on the mounting stand;
• a substrate checking unit configured to check for presence or absence or a position of a substrate within the substrate accommodation container with the cover thereof being opened;
• a substrate transfer mechanism configured to transfer a substrate within the substrate accommodation container to a processing chamber;
• a substrate processing unit configured to perform processing on the substrate within the processing chamber which has been transferred by the substrate transfer mechanism;
• and
• a controller configured to control the operation of the cover opening and closing unit, substrate checking unit, substrate processing unit, and substrate transfer mechanism,
• wherein the substrate accommodation container includes a first substrate accommodation container and a second substrate accommodation container, and, while the substrate processing unit is processing a substrate transferred from the first substrate accommodation container to the processing chamber by the substrate transfer mechanism, when the second substrate accommodation container is mounted on the mounting stand, the controller provides control to open the cover of the second substrate accommodation container and check a substrate within the second substrate accommodation container by means of the substrate checking unit, and when the substrate checking is terminated, the controller provides control to close the cover of the second substrate accommodation container.