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US 2012/0258556 A1Published application
Method for manufacturing liquid ejecting head
AssigneeSeiko Epson Corporation
InventorYasuyuki MATSUMOTO
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Abstract
A method for manufacturing an ink jet recording head is employed which has a metal mask formation process for forming a metal mask having a predetermined shape containing a silicide film formed by silicidation of the surface of a flow path forming substrate wafer containing a silicon substrate and a liquid flow path formation process for forming a liquid flow path by anisotropically etching the flow path forming substrate wafer using the metal mask as a mask.
Claims5
A method for manufacturing a liquid ejecting head, comprising:
- a metal mask formation process for forming a metal mask having a predetermined shape containing a silicide film formed by silicidation of a surface of a silicon substrate;
- and
- a liquid flow path formation process for forming a liquid flow path by anisotropically etching the silicon substrate by using the metal mask as a mask.
Dependencies are inferred from the claim text.