Resist composition and method for producing resist pattern

A resist composition comprising

• (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid,
• (B) an acid generator represented by the formula (II), and
• (D) a compound represented by the formula (I),
• wherein R1 and R2 in each occurrence independently represent a C1 to C12 hydrocarbon group, a C1 to C6 alkoxyl group, a C2 to C7 acyl group, a C2 to C7 acyloxy group, a C2 to C7 alkoxycarbonyl group, a nitro group or a halogen atom;
• m and n independently represent an integer of 0 to 4;
• wherein R3 and R4 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group;
• X1 represents an C1 to C17 divalent saturated hydrocarbon group, and one or more hydrogen atom contained in the divalent saturated hydrocarbon group may be replaced by a fluorine atom, one or more —CH2— contained in the divalent saturated hydrocarbon group may be replaced by —O— or —CO—;
• R5 represents a group having cyclic ether structure;
• and
• Z1+ represents an organic cation.