Surface treatment method for a mask blank, method of manufacturing a mask blank, and method of manufacturing a mask
AssigneeHoya Corporation
InventorsTakeyuki YAMADA, Toshiyuki SUZUKI, Masahiro HASHIMOTO, Yasunori YOKOYA
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Abstract
Provided is a mask blank surface treatment method for surface-treating, using a treatment liquid, a surface of a thin film, to be formed into a transfer pattern, of a mask blank having the thin film on a substrate. The thin film is made of a material that can be etched by ion-based dry etching. The concentration of an etching inhibitor contained in the treatment liquid is 0.3 ppb or less.
Claims24
A mask blank surface treatment method for surface-treating, using a treatment liquid, a surface of a thin film, to be formed into a transfer pattern, of a mask blank having the thin film on a substrate,
- wherein the thin film is made of a material that can be etched by ion-based dry etching, and
- a concentration of an etching inhibitor contained in the treatment liquid is 0.3 ppb or less.
A mask blank surface treatment method for surface-treating, using a treatment liquid, a surface of a thin film, to be formed into a transfer pattern, of a mask blank having the thin film on a substrate,
- wherein the thin film is made of a material that can be etched by ion-based dry etching, and
- a concentration of an etching inhibitor contained in the treatment liquid is set so that the number of convex portions that remain on a surface of the substrate after removing the surface-treated thin film by etching with a dry etching gas which enables the ion-based dry etching becomes 200 or less in a transfer pattern forming region.
Dependencies are inferred from the claim text.