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US 2012/0257185 A1Published application
Apparatus for manufacturing a mask
AssigneeSamsung Electronics Co., Ltd.
InventorsJin-Seok HEO, Chang-Min Park, Seok-Hwan Oh, Jeong-Ho Yeo
Life of this patent
Estimating the term…
Abstract
A method of manufacturing a mask includes dividing an upper surface of a template having a design pattern into a plurality of regions, the template being arranged over a polymer layer on a mask substrate, correcting a distorted region among the regions, pressing the polymer layer with the template to form a mask pattern corresponding to the design pattern on the polymer layer; and curing the mask pattern.
Claims9
1-6. (canceled)
An apparatus for manufacturing a mask, the apparatus comprising:
- a template having a design pattern;
- a correcting unit that divides an upper surface of the template into a plurality of regions, the correcting unit being connected to each of the regions to selectively correct a distorted region among the regions;
- a pressing unit that presses a polymer layer with the template to form a mask pattern corresponding to the design pattern on the polymer layer;
- and
- a curing unit that cures the mask pattern.
2 more elements
14-16. (canceled)
Dependencies are inferred from the claim text.