Lithographic apparatus and device manufacturing method

A lithographic projection apparatus comprising:

• a support structure that supports a patterning device, the patterning device patterns a beam of radiation according to a desired pattern;
• a substrate table that holds a substrate;
• a projection system that projects the patterned beam onto a target portion of the substrate;
• and
• a liquid supply system that at least partly fills a space between the projection system and the substrate with a liquid, the liquid supply system comprising a first port that provides liquid to the space and a valve that connects the first port to a vacuum source, wherein the valve automatically connects the first port to the vacuum source upon an apparatus failure.

A lithographic projection apparatus comprising:

• a support structure that supports a patterning device, the patterning device patterns a beam of radiation according to a desired pattern;
• a substrate table that holds a substrate;
• a projection system that projects the patterned beam onto a target portion of the substrate;
• a liquid supply system that at least partly fills a space between the projection system and the substrate with a liquid, the liquid supply system comprising a first port that provides liquid to the space and a valve in communication with the first port to selectively connect the first port to a vacuum source;
• and
• a controller coupled to the valve to connect the first port to the vacuum source upon occurrence of a failure of the apparatus, and to otherwise cause the valve to connect the first port to a supply of the liquid.

A lithographic projection apparatus, comprising:

• a support structure configured to support a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern;
• a substrate table configured to hold a substrate;
• a projection system configured to project the patterned beam onto a target portion of the substrate;
• and
• a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid to form a liquid reservoir, the liquid supply system comprising an overflow region from the liquid reservoir.

A lithographic projection apparatus, comprising:

• a support structure configured to support a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern;
• a substrate table configured to hold a substrate;
• a projection system configured to project the patterned beam onto a target portion of the substrate;
• a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid;
• and
• a barrier configured to bound the liquid, the barrier having a ridge with an area equal to or larger than the area of a surface of a final element of the projection system configured to be in contact with the liquid.

A lithographic projection apparatus, comprising:

• a support structure configured to support a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern;
• a substrate table configured to hold a substrate;
• a projection system configured to project the patterned beam onto a target portion of the substrate;
• and
• a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, the liquid supply system comprising an inlet configured to provide liquid to the space and a liquid confinement structure extending along at least a part of the boundary of the space, the inlet being adjacent to an inner periphery of the liquid confinement structure and directed towards the target portion of the substrate.

A lithographic projection apparatus comprising:

• a support structure configured to support a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern;
• a substrate table configured to hold a substrate;
• a projection system configured to project the patterned beam onto a target portion of the substrate;
• and
• a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, the liquid supply system comprising:
• a liquid confinement structure extending along at least a part of the boundary of the space, the liquid confinement structure and the projection system configured to form a capillary passage, and
• an outlet configured to remove liquid from the space and to remove the liquid at the end of at least part of the capillary passage.

A lithographic projection apparatus comprising:

• a support structure configured to support a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern;
• a substrate table configured to hold a substrate;
• a projection system configured to project the patterned beam onto a target portion of the substrate;
• and
• a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, the liquid supply system comprising an inlet configured to provide liquid to the space and a valve configured to connect the inlet to a high vacuum source.