Reflective extreme ultraviolet mask and method of manufacturing the same

A method of manufacturing a reflective EUV mask, the method comprising:

• forming a reflective layer on an upper surface of a mask substrate, the substrate including an exposing region and a peripheral region;
• forming an absorbing layer on an upper surface of the reflective layer;
• etching the reflective layer and the absorbing layer in the peripheral region to form:
• a first opening in the reflective layer, the first opening exposing the upper surface of the mask substrate, and
• an absorbing layer pattern having a second opening in fluidic communication with the first opening;
• and
• forming a crystalline portion at a portion of the upper surface of the mask substrate exposed through the first opening and the second opening such that the crystalline portion scatters light incident to the peripheral region and decreases reflectivity of the peripheral region.

A reflective EUV mask, comprising:

• a mask substrate having an exposing region and a peripheral region, the mask substrate including a light scattering crystalline portion in the peripheral region;
• a reflective layer on an upper surface of the mask substrate, the reflective layer including a first opening therethrough, the first opening overlying the crystalline portion of the mask substrate;
• and
• an absorbing layer pattern on an upper surface of the reflective layer, the absorbing layer pattern having a second opening therethrough, the second opening overlying the first opening.