Back to results
US 2012/0236994 A1Published application
Method of characterizing integrated memory structures
AssigneeAndreas Hieke
InventorAndreas Hieke
Life of this patent
Estimating the term…
Abstract
A method of determining the deviation of measured pattern vs. computed pattern is disclosed. Other methods are also disclosed herein.
Claims20
A method comprising:
- exposing spatially repetitive structures on partially or completely fabricated integrated circuits or wafers to electromagnetic radiation, recording the diffractive patterns created thereby, analyzing the collected data and deriving information regarding geometric data with which such repetitive structure were fabricated or aligned.
A method according claim, wherein the computation of the diffractive includes a first step in which the electromagnetic scattering behavior of one spatially receptive unit is determined by analytical or numerical methods, and in a second step the response of the entire exposed structure is computed by superposition of the individual scattering events thereby modeling the effect of diffraction.
Dependencies are inferred from the claim text.