Exposure apparatus
AssigneeV Technology Co., Ltd.
InventorsMichinobu Mizumura, Kazushige Hashimoto, Makoto Hatanaka
Life of this patent
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Abstract
Exposure apparatus includes photomasks on which a mask pattern having the same shape as that of an exposure pattern exposed onto a surface of a TFT substrate held on a stage is formed, lens assemblies in which unit lens groups in each of which a plurality of convex lenses are arranged in a normal direction to the photomasks so that same-size erect images of mask patterns formed on the photomasks can be formed on the surface of the TFT substrate are arranged in a plane parallel with the photomasks and the surface of the TFT substrate held on the stage, and moving device that moves the lens assemblies in a plane parallel with the masks and the surface of TFT substrate held on the stage.
Claims11
An exposure apparatus comprising:
- a photomask on which a mask pattern having the same shape as that of an exposure pattern exposed onto a surface of an object to be exposed held on a stage is formed;
- a lens assembly which is disposed between the photomask and the stage and in which a plurality of unit lens groups in each of which a plurality of convex lenses are arranged in a normal direction to the photomask so that a same-size erect image of the mask pattern formed on the photomask can be formed on the surface of the object to be exposed are arranged in a plane parallel with the photomask and the surface of the object to be exposed held on the stage;
- and
- a moving device that moves the lens assembly in a plane parallel with the photomask and the surface of the object to be exposed held on the stage.
Dependencies are inferred from the claim text.