Photo-crosslinkable material for organic thin film transistor insulating layer

An organic thin film transistor insulating layer material comprising a macromolecular compound that has a repeating unit represented by the formula:

• wherein R1 represents a hydrogen atom or a methyl group;
• R represents a hydrogen atom or a monovalent organic group having from 1 to 20 carbon atoms;
• Rf represents a fluorine atom or a monovalent organic group having fluorine atom(s) and from 1 to 20 carbon atoms;
• Raa represents a divalent organic group having from 1 to 20 carbon atoms, wherein a hydrogen atom in the divalent organic group may have been substituted with a fluorine atom;
• a represents an integer of 0 to 20, and b represents an integer of 1 to 5;
• when there are two or more Raa's, they may be the same or different;
• when there are two or more R's, they may be the same or different;
• and when there are two or more Rf's, they may be the same or different,
• and a repeating unit represented by the formula:
• wherein R2 represents a hydrogen atom or a methyl group;
• R′ represents a hydrogen atom or a monovalent organic group having from 1 to 20 carbon atoms;
• Rbb represents a divalent organic group having from 1 to 20 carbon atoms, wherein a hydrogen atom in the divalent organic group may have been substituted with a fluorine atom;
• c represents an integer of 0 to 20, and d represents an integer of 1 to 5;
• X represents a chlorine atom, a bromine atom or an iodine atom;
• when there are two or more Rbb's, they may be the same or different;
• when there are two or more R's, they may be the same or different;
• and when there are two or more X's, they may be the same or different.