Light-Emitting Device and Manufacturing Method Thereof

A method for manufacturing a light-emitting device comprising the steps of:

• preparing a first substrate;
• forming a first insulating layer over the first substrate;
• forming a first reflective layer over the first insulating layer;
• forming a first conductive layer capable of transmitting light over the first reflective layer;
• forming a first EL layer over the first conductive layer capable of transmitting light;
• preparing a second substrate;
• forming a second insulating layer over the second substrate;
• forming a second reflective layer over the second insulating layer;
• forming a second conductive layer capable of transmitting light over the second reflective layer;
• forming a second EL layer over the second conductive layer capable of transmitting light;
• forming a third conductive layer capable of transmitting light over the first EL layer;
• and
• forming a fourth conductive layer capable of transmitting light over the second EL layer,
• wherein the second EL layer is formed in a same film formation chamber with a substantially same condition as the first EL layer is formed, and
• wherein a thickness of the first conductive layer capable of transmitting light is different from a thickness of the second conductive layer capable of transmitting light.

A method for manufacturing a light-emitting device comprising the steps of:

• preparing a first substrate;
• forming a first insulating layer over the first substrate;
• forming a first conductive layer capable of transmitting light over the first insulating layer;
• forming a first EL layer over the first conductive layer capable of transmitting light;
• preparing a second substrate;
• forming a second insulating layer over the second substrate;
• forming a second conductive layer capable of transmitting light over the second insulating layer;
• forming a second EL layer over the second conductive layer capable of transmitting light;
• forming a first reflective layer having conductivity over the first EL layer;
• and
• forming a second reflective layer having conductivity over the second EL layer,
• wherein the second EL layer is formed in a same film formation chamber with a substantially same condition as the first EL layer is formed,
• wherein a thickness of the first conductive layer capable of transmitting light is different from a thickness of the second conductive layer capable of transmitting light, and
• wherein the first substrate and the second substrate are capable of transmitting light.

A method for manufacturing a light-emitting device comprising the steps of:

• preparing a first substrate;
• forming a first insulating layer over the first substrate;
• forming a reflective layer over the first insulating layer;
• forming a first conductive layer capable of transmitting light to partly have a different thickness over the reflective layer;
• forming a first EL layer over the first conductive layer capable of transmitting light;
• preparing a second substrate;
• forming a second insulating layer over the second substrate;
• forming a second conductive layer capable of transmitting light to partly have a different thickness over the second insulating layer;
• forming a second EL layer over the second conductive layer capable of transmitting light;
• forming a third conductive layer capable of transmitting light over the first EL layer;
• and
• forming a fourth conductive layer capable of transmitting light over the second EL layer,
• wherein the second EL layer is formed in a same film formation chamber with a substantially same condition as the first EL layer is formed, and
• wherein a thickness of the first conductive layer capable of transmitting light is partly different from a thickness of the second conductive layer capable of transmitting light.

A method for manufacturing a light-emitting device comprising the steps of:

• preparing a first substrate;
• forming a first insulating layer over the first substrate;
• forming a first conductive layer capable of transmitting light over the first insulating layer;
• forming a first EL layer over the first conductive layer capable of transmitting light;
• preparing a second substrate;
• forming a second insulating layer over the second substrate;
• forming a second conductive layer capable of transmitting light over the second insulating layer;
• forming a second EL layer over the second conductive layer capable of transmitting light;
• forming a first reflective layer having conductivity over the first EL layer;
• and
• forming a second reflective layer having conductivity over the second EL layer,
• wherein the second EL layer is formed in a same film formation chamber with a substantially same condition as the first EL layer is formed,
• wherein a thickness of the first conductive layer capable of transmitting light is partly different from a thickness of the second conductive layer capable of transmitting light, and
• wherein the first substrate and the second substrate have a light-transmitting property.

A light-emitting device comprising:

• a substrate;
• an insulating surface over the substrate;
• a reflective layer over the insulating surface;
• a first conductive layer capable of transmitting light over the reflective layer;
• an EL layer over the first conductive layer capable of transmitting light;
• and
• a second conductive layer capable of transmitting light over the EL layer,
• wherein the first conductive layer capable of transmitting light includes a region with a partly different thickness, and
• wherein the EL layer comprises substantially the same composition on an entire surface.

A light-emitting device comprising:

• a light-transmitting substrate;
• an insulating surface over the light-transmitting substrate;
• a conductive layer capable of transmitting light over the insulating surface;
• an EL layer over the conductive layer capable of transmitting light;
• and
• a reflective layer having conductivity over the EL layer,
• wherein the conductive layer capable of transmitting light includes a region with a partly different thickness, and
• wherein the EL layer comprises substantially the same composition on an entire surface.