Liquid processing apparatus, liquid processing method and storage medium

A liquid processing apparatus that performs a liquid process by supplying a processing solution to a surface of a target substrate, the liquid processing apparatus comprising:

• a housing in which the liquid process is performed;
• a rotation unit configured to hold the target substrate within the housing and rotate the target substrate around a vertical axis;
• a processing solution supply nozzle configured to supply the processing solution to the surface of the target substrate being held and rotated by the rotation unit;
• a cup provided around the rotation unit;
• a first gas supply unit, provided to face the target substrate held by the rotation unit, configured to form a downward flow of a first gas that flows over the entire surface of the target substrate and is introduced into the cup in order to form a processing atmosphere on the surface of the target substrate;
• and
• a second gas supply unit configured to form a downward flow of a second gas different from the first gas in a region outside the downward flow of the first gas,
• wherein the first gas supply unit and the second gas supply unit are provided at a ceiling portion of the housing.