Template derivative for forming ultra-low dielectric layer and method of forming ultra-low dielectric layer using the same

A method of forming an ultra-low dielectric layer using a template derivative for forming ultra-low dielectric layer, comprising the steps of:

• forming a layer using a cyclodextrin derivative represented by the following
• wherein, in the formula, n is an integer of 6 to 8 and m represents an integer of 1 to 3, and the cyclodextrin derivative is capped with Si—H;
• and
• curing the layer formed using the cyclodextrin derivative in an atmosphere of hydrogen peroxide.