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US 2012/0231629 A1Published application
Template and pattern forming method
AssigneeKabushiki Kaisha Toshiba
InventorsYukiko Kikuchi, Shinichi Ito
Life of this patent
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Abstract
A template for imprinting in which a pattern is transferred onto a first substrate applied curable resin thereon, including a second substrate having a surface to be contacted with the curable resin, a concave portion provided on the surface and corresponding to a pattern to be transferred onto the first substrate, and at least one convex portion arranged in the concave portion to decrease volume of
Claims7
-12. (canceled)
A pattern forming method comprising:
- applying curable resin on a first substrate;
- contacting the curable resin with a template which is used for imprinting in which a pattern is transferred onto the curable resin applied on the first substrate, wherein the pattern comprises a large pattern of a pad, a dummy pattern, or a mark and having a dimension of 100 nm or more, and a fine pattern smaller than the large pattern, the template comprising:
- a second substrate having a surface to be contacted with the curable resin;
- a concave portion having a concave contour provided on the surface and corresponding to the large pattern to be transferred onto the first substrate;
- and a plurality of convex portions arranged in the concave portion to decrease volume of the concave portion;
- curing the curable resin;
- separating the template from the cured curable resin to form the pattern of the cured curable resin;
- and
- etching the first substrate by using the pattern of the cured curable resin as a mask to form a pattern on the first substrate.
6 more elements
-18. (canceled)
Dependencies are inferred from the claim text.