Actinic-ray- or radiation-sensitive resin composition and method of forming a pattern using the same

An actinic-ray- or radiation-sensitive resin composition comprising:

• a resin that is decomposed when acted on by an acid to thereby increase its solubility in an alkali developer,
• a compound that generates an acid when exposed to actinic rays or radiation, and
• any of basic compounds of general formula (1) below,
• in which
• each of l, m, o, p and q independently is an integer of 1 or greater,
• n is an integer of 2 or greater,
• each of r and s independently is an integer of 1 or greater,
• t is an integer of 0 or greater,
• each of —X1— and —X2— independently represents —O—, —S— or —CO—,
• each of R1 and R2 independently represents a hydrogen atom, an alkyl group, an aryl group or an aralkyl group, and
• R3 represents a hydrogen atom, an alkyl group, an aryl group or an aralkyl group when n is 3 or greater and t is 1 or greater;
• represents an alkyl group, an aryl group or an aralkyl group when t is 0;
• and represents an aryl group or an aralkyl group when n is 2.