Ceramic Coating Deposition

A method for applying a material to a part, the method comprising:

• placing the part in a deposition chamber;
• applying a first electric potential to the part;
• evaporating components for forming a TBC material;
• ionizing the evaporated components and the reactive gas;
• and
• modulating the first electric potential so as to draw the ionized components to the part,
• wherein the modulating comprises:
• a plurality of first intervals, each comprising a series of pulses of negative potential;
• and
• a plurality of second intervals alternating with the first intervals and each comprising the first potential being essentially zero voltage.

An apparatus for depositing material on a workpiece comprising:

• a deposition chamber;
• deposition material at least partially within the deposition chamber;
• a first electron beam source, positioned to direct a first electron beam to vaporize a portion of the deposition material;
• an ionizing system positioned to ionize the vaporized material and the reactive gas;
• a bias voltage source connected to apply an electric potential to the workpiece;
• and
• a control apparatus coupled to the bias voltage source and configured to apply said electric potential in:
• a plurality of first steps for PAPVD, each comprising a series of pulses of negative potential;
• and
• a plurality of second steps for PVD alternating with the first steps.