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US 2012/0223256 A1Published application
Systems and methods for optics cleaning in an euv light source
AssigneeCymer, Inc.
InventorsAlexander N. Bykanov, Silvia De Dea, Alexander I. Ershov, Vladimir B. Fleurov, Igor V. Fomenkov, William N. Partlo
Life of this patent
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Abstract
An extreme-ultraviolet (EUV) light source is described herein comprising an optic; a primary EUV light radiator generating an EUV light emitting plasma and producing a deposit on said optic; and a cleaning system comprising a gas and a secondary light radiator, the secondary light radiator generating a laser produced plasma and producing a cleaning species with the gas.
Claims20
An extreme-ultraviolet (EUV) light source comprising;
- an optic;
- a primary EUV light radiator generating an EUV light emitting plasma and producing a deposit on said optic;
- and
- a cleaning system comprising a gas and a secondary light radiator, said secondary light radiator generating a laser produced plasma and producing a cleaning species with the gas.
1 more element
An extreme-ultraviolet (EUV) light source comprising;
- an optic;
- a system generating an EUV light emitting plasma, the EUV light emitting plasma producing a deposit on said optic;
- and
- a cleaning system, the cleaning system comprising a gas and generating light having a wavelength below 125 nm, the cleaning system irradiating said deposit with said light having a wavelength below 125 nm to produce a cleaning species with said gas.
1 more element
A method comprising the steps of:
- providing an optic;
- generating an EUV light emitting plasma for substrate exposure during a burst period, the EUV light emitting plasma producing a deposit on said optic;
- and
- providing a gas and generating a laser produced plasma to produce a cleaning species with the gas during an intervening period.
1 more element
Dependencies are inferred from the claim text.