Thermal processing apparatus and method of controlling the same
AssigneeTokyo Electron Limited
InventorsKoji YOSHII, Tatsuya YAMAGUCHI, Wenling WANG, Takanori SAITO
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AssigneeTokyo Electron Limited
InventorsKoji YOSHII, Tatsuya YAMAGUCHI, Wenling WANG, Takanori SAITO
Estimating the term…
A control unit can select a large-number control zone model in which the number of control zones, which are independently controlled, is large, and a small-number control zone model in which the number of control zones, which are independently controlled, is small. When a temperature is increased or decreased, the control unit can select the small-number control zone model so as to control, based on signals from temperature sensors of the respective control zones C1 . . . C5 whose number is small, heaters located on the respective control zones C1 . . . C5. When a temperature is stabilized, the control unit can select the large-number control zone model so as to control, based on signals from the temperature sensors of the respective control zones C1 . . . C10 whose number is large, the heaters located on the respective control zones C1 . . . C10.
A thermal processing apparatus comprising:
A thermal processing apparatus comprising:
A method of controlling a thermal processing apparatus comprising:
A method of controlling a thermal processing apparatus comprising:
Dependencies are inferred from the claim text.