Silicon-incorporated diamond-like carbon film, fabrication method thereof, and its use
AssigneeKorea Institute of Science and Technology
InventorsMyoung-Woon Moon, Kwang Ryeol Lee, Jin Woo Yin, Hae-Ri Kim
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Abstract
A silicon-incorporated diamond-like carbon thin film, a fabrication method thereof, and its use are disclosed. The silicon-incorporated diamond-like carbon thin film comprises a chemical bond between carbon and silicon atoms present on a surface of the silicon-incorporated diamond-like carbon thin film comprising silicon incorporated within and on the surface thereof with an atom providing hydrophilicity to the surface of the thin film on the surface of the thin film.
Claims30
A silicon-incorporated diamond-like carbon thin film containing chemical bonds of carbon and silicon atoms present on a surface of said film, comprising silicon incorporated within and on the surface thereof with an atom (A) providing hydrophilicity to the surface of said film on the surface of said film.
A method for improving blood compatibility of a silicon-incorporated diamond-like carbon thin film, wherein silicon is present within and on the surface of the thin film, which method comprises treating a surface of said film with an oxygen or nitrogen plasma or ion beam, to generate Si—N or Si—O bonds on the surface of said film.
A method for providing hydrophilicity to a silicon-incorporated diamond-like carbon thin film, wherein silicon is present within and on the surface of said film which method comprises treating said film with an oxygen or nitrogen plasma or ion beam, to generate Si—N or Si—O bonds on the surface of the film.
A method for semi-permanently maintaining hydrophilicity of a silicon-incorporated diamond-like carbon thin film, wherein silicon is present within and on the surface of said film which method comprises treating said film with oxygen plasma to generate Si—O bonds on the surface of the thin film.
Dependencies are inferred from the claim text.