US 2012/0075972 A1 · ELECTRON BEAM IRRADIATING APPARATUS AND LITHOGRAPHY METHOD

Abstract

An electron beam irradiating apparatus according to an embodiment includes: a deflector configured to perform blanking or deflecting of the electron beam emitted from an electron gun, the blanking being performed based on a blanking control signal, the deflecting being performed based on a deflection control signal, or blanking and deflecting being performed based on the blanking control signal and the deflection control signal; a first clock signal generation circuit configured to generate a first reference clock signal having cycles which vary with a drawing radial position on the stage; a second clock signal generation circuit configured to generate a second reference clock signal having cycles which are independent of the first reference clock signal; and a control signal generation circuit configured to generate a first control signal that is at least one of the blanking control signal and the deflection control signal, based on the first reference clock signal and the second reference clock signal.

Claims10

Dependent claims

An electron beam irradiating apparatus comprising:

a rotation mechanism configured to rotate a stage which holds a substrate, a photosensitive resin film being formed on the substrate;
a movement mechanism configured to move the stage in a horizontal direction;
an electron gun configured to emit an electron beam onto the photosensitive resin film;
a deflector configured to perform blanking or deflecting of the electron beam emitted from the electron gun, the blanking being performed based on a blanking control signal, the deflecting being performed based on a deflection control signal, or blanking and deflecting being performed based on the blanking control signal and the deflection control signal;
a first clock signal generation circuit configured to generate a first reference clock signal having cycles which vary with a drawing radial position on the stage;
a second clock signal generation circuit configured to generate a second reference clock signal having cycles which are independent of the first reference clock signal;
and
a control signal generation circuit configured to generate a first control signal that is at least one of the blanking control signal and the deflection control signal, based on the first reference clock signal and the second reference clock signal.

5 more elements

An electron beam irradiating method for drawing a pattern by emitting an electron beam onto a photosensitive resin film with the use of an electron beam irradiating apparatus including:

a rotation mechanism rotating a stage which holds a substrate, the photosensitive resin film being formed;
a movement mechanism moving the stage in a horizontal direction;
an electron gun emitting an electron beam onto the photosensitive resin film;
and a deflector blanking or deflecting the electron beam emitted from the electron gun, the blanking being performed based on a blanking control signal, the deflection being performed based on a deflection control signal, or blanking and deflecting the electron beam emitted from the electron gun based on the blanking control signal and the deflection control signal,
the electron beam irradiating method comprising:
generating a first reference clock signal having cycles which vary at least with a drawing radial position on the stage;
generating a second reference clock signal having cycles which are independent of the first reference clock signal;
and
generating a first control signal that is at least one of the blanking control signal and the deflection control signal, based on the first reference clock signal and the second reference clock signal.

6 more elements

Dependencies are inferred from the claim text.

Electron beam irradiating apparatus and lithography method

Life of this patent

Electron beam irradiating apparatus and lithography method

Life of this patent

Abstract

Claims10