Method of manufacturing solid-state imaging device, solid-state imaging device, and electronic apparatus

A solid-state imaging device, comprising:

• a substrate including a plurality of photoelectric conversion units arranged on the surface thereof;
• a first pattern having an island shape which is configured by an optical filter material and independently disposed on some of the photoelectric conversion units among the plurality of photoelectric conversion units;
• a mixed color prevention layer self-alignedly disposed on a side wall of the first pattern;
• and
• a second pattern having an island shape which is configured by an optical filter material and independently disposed on the rest of the photoelectric conversion units among the plurality of photoelectric conversion units while the mixed color prevention layer is closely disposed between the first pattern and the second pattern.

An electronic apparatus, comprising:

• a solid-state imaging device;
• an optical system introducing incident light to a photoelectric conversion unit of the solid-state imaging device;
• and
• a signal processing circuit processing an output signal of the solid-state imaging device,
• wherein the solid-state imaging device includes a substrate including a plurality of photoelectric conversion units arranged on the surface thereof;
• a first pattern having an island shape which is configured by an optical filter material and independently disposed on some of the photoelectric conversion units among the plurality of photoelectric conversion units;
• a mixed color prevention layer self-alignedly disposed on a side wall of the first pattern;
• and
• a second pattern having an island shape which is configured by an optical filter material and independently disposed on the rest of the photoelectric conversion units among the plurality of photoelectric conversion units while the mixed color prevention layer is closely disposed between the first pattern and the second pattern.