Substrate position detection apparatus, film deposition apparatus equipped with the same, and substrate position detection method

A substrate position detection apparatus used in a semiconductor fabrication apparatus provided with a process chamber where a predetermined process is carried out with respect to a substrate, and a susceptor that is rotatably housed in the process chamber and has a substrate receiving portion in which the substrate subject to a position detection is placed, to thereby detect a position of a substrate, the substrate position detection apparatus comprising:

• an image taking unit that takes an image of an area that includes:
• first two position detection marks provided in the process chamber so that the first two position detection marks are within the image taking area, wherein a first perpendicular bisector of the first two position detection marks passes through a rotational center of the susceptor,
• second two position detection marks provided in the susceptor so that the second two position detection marks can be within the image taking area, wherein a second perpendicular bisector of the second two position detection marks passes through the rotational center of the susceptor and a center of the substrate receiving portion, and
• a circumferential area of the substrate receiving portion;
• and
• a control portion that
• detects the first two position detection marks and the second two position detection marks in accordance with the image taken by the image taking unit and
• determines whether the substrate receiving portion is positioned in a predetermined range in accordance with the detected first two position detection marks and the detected second two position detection marks.