Single matching network for matching multi-frequency and method of constructuring the same and radio frequency power source system using the same

An RF power source system for switchingly coupling one of at least two frequencies f1 and f2 to an electrode of a plasma process chamber, the RF power source system comprising:

• an RF power source device for selectively outputting one of the frequencies f1 and f2;
• a matching network having an input terminal connected to the RF power source device and an output terminal connected to the electrode, wherein the matching network comprises a capacitor with the capacitance value of C0 and an inductor with the inductance value of L0, and the capacitor and the inductor are connected in series with each other to form a branch;
• and
• wherein, the capacitance value C0 and the inductance value L0 satisfy the following relations:
• jω1L0+1/jω1C0=jy1
• jω2L0+1/jω2C0=jy2
• wherein, ω1=2πf1, ω2=2πf2, the f1 and f2 are respectively the two frequencies, y1 is the impedance required for the branch when achieving a matching state at frequency f1, and y2 is the impedance required for the branch when achieving a matching state at frequency f2.

A method of constructing a matching network, wherein the matching network is adapted to couple RF energy from an RF power source device to a plasma load, and the RF power source device selectively provides a power output working at a frequency fl or f2, the method including the following steps:

• selecting a capacitor and an inductor in the matching network according to the following expressions, wherein the capacitor and the inductor are connected in series with each other to form a branch, the capacitance value of the capacitor is C0, and the inductance value of the inductor is L0:
• jω1L0+1/jω1C0=jy1
• jω2L0+1/jω2C0=jy2
• wherein, ω1=2πf1, ω2=2πf2, the f1 and f2 are two frequencies, y1 is the impedance required for the branch when achieving a matching state at the frequency f1, and y2 is the impedance required for the branch when achieving a matching state at the frequency f2;
• and
• connecting the capacitor and the inductor in series to obtain the matching network, and connecting the matching network in series between the RF power source device and the plasma load.

An RF power source system for switchingly coupling one of at least two frequencies f1 and f2 to an electrode of a plasma process chamber, the RF power source system comprising:

• an RF power source device for selectively outputting one of the frequencies f1 and f2;
• a matching network having an input terminal connected to the RF power source device and an output terminal connected to the electrode, wherein the matching network comprises a capacitor with the capacitance value of C4 and an inductor with the inductance value of L4, and the capacitor and the inductor are connected in parallel with each other to form a branch;
• and
• the capacitance value C4 and the inductance value L4 satisfy the following relations:
• 1/jω1L4+jω1C4=1/jy1
• 1/jω2L4+jω2C4=1/jy2
• wherein, ω1=2πf1, ω2=2πf2, the f1 and f2 are respectively the two frequencies, y1 is the impedance required for the branch when achieving a matching state at the frequency f1, and y2 is the impedance required for the branch when achieving a matching state at the frequency f2.

A method of constructing a matching network, wherein the matching network is adapted to couple RF energy from an RF power source device to a plasma load, and the RF power source device selectively provides a power output working at the frequency f1 or f2, the method including the following steps:

• selecting a capacitor and an inductor in the matching network according to the following expressions, wherein the capacitor and the inductor are connected in parallel with each other to form a branch, the capacitance value of the capacitor is C4, and the inductance value of the inductor is L4:
• 1/jω1L4+jω1C4=1/jy1
• 1/jω2L4+jω2C4=1/jy2
• wherein, ω1=2πf1, ω2=2πf2, the f1 and f2 are respectively two frequencies, y1 is the impedance required for the branch when achieving a matching state at the frequency f1, and y2 is the impedance required for the branch when achieving a matching state at the frequency f2;
• and
• connecting the capacitor and the inductor in parallel to obtain the matching network, and connecting the matching network in series between the RF power source device and the plasma load.