Narrow frame touch input sheet, manufacturing method of same, and conductive sheet used in narrow frame touch input sheet

A method for manufacturing a narrow frame touch input sheet, comprising:

• forming and stacking transparent conductive films, light-excluding conductive electrode films, and first resist layers sequentially on both surfaces of a transparent base sheet;
• exposing and developing the first resist layers simultaneously on the both surfaces;
• etching the transparent conductive films and the light-excluding conductive electrode films simultaneously on the both surfaces;
• stripping the first resist layers so as to form a fine wiring circuit pattern with the stacked transparent conductive film and light-excluding conductive electrode film in an outer edge portion on each of the two surfaces of the base sheet;
• forming a second resist layer to cover the fine wiring circuit pattern on each surface of the base sheet;
• and
• etching only the light-excluding electrode conductive film layer on which the second resist layer is not formed, so that a circuit pattern of the transparent conductive film is exposed in a central window portion on each surface of the base sheet.

A method for manufacturing a narrow frame touch input sheet comprising:

• forming and stacking a transparent conductive film, a light-excluding conductive electrode film, and a first resist layer sequentially on each of two transparent base sheets;
• stacking the base sheets to be opposite to each other so that the transparent conductive films, the light-excluding conductive electrode films, and the first resist layers are formed on both surfaces of the stacked base sheets;
• exposing and developing the first resist layers simultaneously on the both surfaces;
• etching the transparent conductive films and the light-excluding conductive electrode films simultaneously on the both surfaces;
• stripping the first resist layers so as to form a fine wiring circuit pattern with the sequentially stacked transparent conductive film and light-excluding conductive electrode film in an outer edge portion on each of the two surfaces of the stacked base sheets;
• forming a second resist layer to cover the fine wiring circuit pattern on each surface of the stacked base sheets;
• and
• etching only the light-excluding conductive electrode film layer in a central window portion on which the second resist layer is not formed on each surface of the stacked base sheets, so that a circuit pattern of the transparent conductive film is exposed.