Method of grooving a chemical-mechanical planarization pad
AssigneeInnopad, Inc.
InventorsPaul LEFEVRE, Oscar K. HSU, David Adam WELLS, John Erik ALDEBORGH, Marc C. JIN, Guangwei WU, Anoop MATHEW
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AssigneeInnopad, Inc.
InventorsPaul LEFEVRE, Oscar K. HSU, David Adam WELLS, John Erik ALDEBORGH, Marc C. JIN, Guangwei WU, Anoop MATHEW
Estimating the term…
A method of forming a chemical mechanical polishing pad. The method includes polymerizing one or more polymer precursors and forming a chemical-mechanical planarization pad including a surface, forming grooves in the surface defining lands between the grooves, wherein the grooves have a first width, and shrinking the lands from a first land length (L1) at the surface to a second land length (L2) at the surface, wherein the second land length (L2) is less than the first land length (L1) and the grooves have a second width (W2) wherein (W1)≦(X)(W2), wherein (X) has a value in the range of 0.01 to 0.75.
A method of forming a chemical-mechanical planarization pad, comprising:
A method of forming chemical-mechanical planarization pad, comprising:
Dependencies are inferred from the claim text.