Reticles with subdivided blocking regions and methods of fabrication
AssigneeMicron Technology, Inc.
InventorJ. Brett Rolfson
Life of this patent
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AssigneeMicron Technology, Inc.
InventorJ. Brett Rolfson
Estimating the term…
Methods for designing, fabricating, and using attenuated phase shift reticles, or photomasks are disclosed. Methods are also disclosed for subdividing the radiation blocking regions of previously fabricated reticles of previously existing designs. The methods may include forming radiation blocking regions that are subdivided, by cut lines, into discrete, spaced apart sections with dimensions (e.g., surface area, etc.) configured to minimize or eliminate the buildup of electrostatic energy by the radiation blocking regions and/or the discharge of electrostatic energy from the radiation blocking regions and the damage that may be caused by such electrostatic discharge. The methods may include configuring the reticle to prevent radiation from passing through the cut lines between adjacent sections of a subdivided radiation blocking region.
A method for fabricating a reticle, comprising:
A method for modifying an existing reticle, comprising subdividing radiation blocking regions of an existing reticle into discrete sections, each discrete section having an area sufficiently small to minimize at least one of buildup of electrostatic energy and electrostatic discharge.
A method for fabricating a reticle, comprising:
A reticle, comprising:
A reticle, comprising:
Dependencies are inferred from the claim text.