Method for determining mask operation activities

A method for determining mask operation activities, comprising:

• obtaining physical layout design data for a programmable data processing apparatus;
• and
• using at least one computing device for:
• running at least one resolution enhancement technology process on the physical layout design data to generate mask features;
• determining an edge placement sensitivity metric for each edge of the generated mask features including the sub-resolution assist feature;
• and
• making a mask operational activity decision based on the edge placement sensitivity metric.

A computer system for determining mask operation activities comprising:

• a component configured to obtain chip physical layout design data to the computer infrastructure;
• a component for running at least one resolution enhancement technology process on the chip physical layout design data to generate mask features;
• a component for determining an edge placement sensitivity metric for each edge of the generated mask features including the sub-resolution assist feature;
• and
• a component for making mask operational activity decisions based on the sensitivity metric.

A computer program comprising program code embodied in at least one computer readable storage medium, which when executed, enables a computer system to implement a method for determining mask operation activities, the method comprising:

• obtaining rule based placement sensitivity classes as based on a placement sensitivity metric;
• generating mask art data, including mask features;
• determining which placement sensitivity classification a mask feature is in;
• and,
• making mask operational activity decisions based on the classification of the feature.