Imaging optics and projection exposure installation for microlithography with an imaging optics of this type
AssigneeCarl Zeiss SMT GmbH
InventorsJohannes Zellner, Aurelian Dodoc, Marco Pretorius, Christoph Menke, Wilhelm Ulrich, Hans-Juergen Mann
Life of this patent
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Abstract
An imaging optics has a plurality of mirrors which image an object field in an object plane in an image field in an image plane. A pupil plane is arranged in the imaging beam path between the object field and the image field. A stop is arranged in the pupil plane. The pupil plane is tilted at an angle (α) with respect to the object plane, where α is greater than 0.1°. The imaging optics results allows for a manageable combination of small imaging errors, manageable production and good throughput.
Claims20
An imaging optics, comprising:
- a plurality of mirrors configured to image an object field in an object plane into an image field in an image plane along an imaging beam path;
- and
- a stop arranged in a pupil plane,
- wherein:
- the pupil plane is in the imaging beam path between the object field and the image field;
- the pupil plane is tilted at an angle greater than 0.1° relative to the object plane;
- and
- the plurality of mirrors comprises more than four mirrors.
An imaging optics, comprising:
- a plurality of mirrors configured to image an object field in an object plane into an image field in an image plane along an imaging beam path, the plurality of mirrors including precisely six mirrors;
- and
- a stop arranged in a pupil plane,
- wherein:
- the pupil plane is in the imaging beam path between the object field and the image field
- the pupil plane is tilted relative to the object plane at an angle greater than 0.1°
- the image plane extends parallel to the object plane;
- the imaging beam path passes through a pupil in the pupil plane precisely once;
- and
- the imaging optics is a microlithography projection optics.
Dependencies are inferred from the claim text.