Fluid handling structure, module for an immersion lithographic apparatus, lithographic apparatus and device manufacturing method

A fluid handling structure for a lithographic apparatus, the fluid handling structure successively having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure:

• a gas knife to resist passage of immersion fluid in a radially outward direction from the space;
• and
• a surface tension lowering fluid opening to provide a surface tension lowering fluid radially outward of the gas knife.

A device manufacturing method comprising:

• projecting a patterned beam of radiation through an immersion liquid confined by a meniscus pinning feature on to a substrate;
• and
• supplying a fluid soluble in the immersion liquid which on dissolution into the immersion liquid lowers the surface tension of the immersion liquid at a position radially outward of the meniscus pinning feature.

A device manufacturing method comprising:

• projecting a patterned beam of radiation through an immersion liquid confined to a space by a gas knife onto a substrate positioned on a table;
• and
• lowering surface tension of the immersion liquid radially outward of the gas knife by providing a surface tension lowering fluid radially outwardly of the gas knife.

A device manufacturing method comprising:

• projecting a patterned beam of radiation through an immersion liquid onto a substrate, wherein the immersion liquid is provided to an immersion fluid enclosure defined by an inside wall of a fluid handling structure and the substrate;
• and
• providing a second liquid with a lower surface tension to the immersion liquid to a gap between the fluid handling structure and the substrate at a position radially inwardly of a meniscus pinning feature of the fluid handling structure.